Equipment for growth and characterisation
of thin films and nanostructures
(for larger photographs please click)
| Pulsed Laser Deposition PLD of thin films using excimer laser LPX 305i and five deposition chambers |  |
| PLD-G-chamber up to 4-inch substrate
diameter, multi-target equipment |
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| PLD-M-chamber with
heater for 15x15 mm² substrates, multi-target equipment,
RF-radical source |
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| PLD-S-chamber
with 4-inch diam. heater, multi-target equipment |
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| PLD-E-chamber with multi-target equipment, 3-inch diam. heater, in-situ spektroscopic ellipsometry. |  |
| PLD-Q-chamber
for gas pressure in mbar-range, for nano-heterostructures
|
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| DC-sputtering chamber for Au, Pt, Ti, Cr, Ag,... |  |
| Surface analysis of structure and morphology by electron diffraction RHEED |  |
| Secondary
neutrals mass spectrometry SNMS Leybold
INA 3 for chemical analysis and depth profiling
|
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| Surface
profiler DEKTAK 3030 |
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| Scan of critical current density of
double-sided high-Tc superconducting thin films up to 71 x 75 mm² area |
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| RCL-measurement with control of sample temperature from -35 up to +85°C |  |
| Scanning Tunneling
Microscope STM
"Beetle STM" |
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| Sintering
furnace up to
1200°C (chamber) and 1800°C (tube),
ball mills,
press moulds for PLD target preparation, in tube furnace also thermal
growth of ZnO-nanostructures. |
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| Microwave vector network analyser Anritsu-Wiltron 37347A up to 20 GHz. |  |
| Zeiss optical
microscope Axiolab with
CCD-camera |
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Michael Lorenz, 08 March, 2004