P02: Chemical Routes to CuI Thin Films and Bulk Material
Prof. Dr. Harald Krautscheid
Copper iodide, CuI, is a wide bandgap p-type conducting material with high hole conductivity. In addition,
CuI is transparent in the visible spectral range. Therefore, CuI thin films and single crystals are interesting
materials for electronic applications. Within the Research Unit FOR 2857, this project focuses on the
development of chemical methods for preparation of CuI thin films and bulk crystals with defined
properties. It aims at understanding of nucleation and growth mechanisms of thin films, investigation of
structural defects and optimization of layer homogeneity and surface morphology.
For CuI deposition as crystalline thin films and as epitactic layers on substrates, metal-organic chemical
vapor deposition (MOCVD) and close distance sublimation (CDS) methods will be developed.
Fundamental studies concern the influence of copper and iodine sources, substrate materials, synthesis
conditions and incorporation of dopants on the microstructure and optical and electrical properties of the
CuI thin films. Eventually, defined n-p heterojunctions between CuI and n-type semiconductors will be
generated. For synthesis of pure and doped CuI single crystals, growth from solution and by sublimation
methods will be investigated in order to obtain strainless crystals.