Nanotechnology 23, 085302 (2012)

G. Bridoux, J. Barzola-Quiquia, F. Bern, W. Böhlmann, I. Vrejoiu, M. Ziese, and P. Esquinazi

Abstract

This paper presents a method to obtain submicron- and nanometer structures of different oxide
films and heterostructures combining e-beam lithography and chemical etching. The most
relevant advantage of this method is that structures of tens of microns in length and below
~100 nm width can be produced, keeping the intrinsic bulk film properties, as proven by
electrical transport measurements. In this way our method provides a bridge that connects the
attractive properties of oxide films and the nanoworld.